Carrier gas purity is essential in any application requiring extreme sensitivity. Impurities limit detector sensitivity and can even destroy capillary columns. The Valco helium purifier (HP2) provides "point-of-use" gas purification of helium or other noble gases, such as Ar, Ne, Kr, and Xe, to sub-ppm levels of reactive gaseous impurities. The nitrogen purifier (NP2) does the same for nitrogen.

The purification substrate in Valco gas purifiers is a non-evaporable heat-activated gettering alloy. This stable alloy is contained in a welded assembly, so the purifiers can be used safely in industrial applications with minimal precautions. The getter is activated by heating, which eliminates the oxide film on the particle surface and allows helium to diffuse into the bulk of the getter particles. The helium and nitrogen purifiers feature a self-regulating design which maintains the getter material at the optimum temperature and eliminates the possibility of thermal runaway.

Available for 110 VAC and 230 VAC.